wet chemical etching meaning in Chinese
湿法蚀刻
Examples
- The purpose of this thesis is to develop the laser assisted wet chemical etching on the gaas substrate . the main contents and contributions include : 1 ) laser - assisted wet mask - etching method and poles - etching method have been proposed laser - assisted wet mask - etching method is that the area which need not etched is covered by mask film , and the uncovered area is processed by laser induced wet etching
本文的工作就是围绕半导体gaas基片的激光化学诱导液相腐蚀技术开展的,主要的研究结果和创新之处如下: 1 )提出了激光诱导液相抗蚀膜掩蔽法和电极腐蚀法抗蚀膜掩蔽法是指在基片表面不需要腐蚀的区域用抗蚀膜覆盖,激光照射在无抗蚀膜区域,对基片进行腐蚀。 - Compared with the conventional chemical etching , laser assisted wet chemical etching can eliminate the effect of crystal orientation efficiently and fabricate more diversified etched pattern ; compared with the laser assisted gas chemical etching , the required condition for laser wet etching can be realized more easily and the operation can be simplified ; compared with the ion etching , it has advantages of no ion damage to substrate , avoiding over - etching and cost - effective
半导体的激光诱导液相腐蚀与普通化学腐蚀相比,可以有效地消除晶体取向影响,制作出更加多样化的腐蚀图形;与激光诱导气相腐蚀相比,其工艺条件更加容易实现,操作更加简单;与干法离子刻蚀相比,对基片无离子损伤,过度腐蚀容易控制,成本低。